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REVISIONS OF THE JAPANESE PATENT LAW Effective mainly from January 1, 2000
A DRAFT OF REVISED EXAMINATION GUIDE LINE FOR COMPUTER SOFTWARE RELATED INVENTIONS IN JAPAN NO.1
A REVISED EXAMINATION GUIDE LINE FOR COMPUTER SOFTWARE RELATED INVENTIONS IN JAPAN NO.2
THE RECENT IMPORTANT CHANGE IN JAPANESE PATENT APPLICATION PRACTICE
RECENT MOVEMENT FOR INTELLECTUAL PROPERTY RIGHTS IN JAPAN
GENERAL OVERVIEW OF THE RECENT REVISION ABOUT JAPANESE PATENT LAW OR THE LIKE
AN EFFECTIVE DATE OF THE NEWLY REVISED INTELLECTUAL PROPERTY LAWS WHICH HAD BEEN PROMULGATED ON JUNE 19, 2002, IN JAPAN
INTRODUCTION OF DISCLOSURE SYSTEM FOR PRIOR ART
RECENT MOVEMENT ABOUT INTELLECTUAL PROPERTY MATTERS IN JAPAN RECENT MOVEMENT ABOUT INTELLECTUAL PROPERTY MATTERS IN JAPAN RECENT REVISION OF IP LAWS IN JAPAN RECENT REVISION OF IP LAWS IN JAPAN RECENT REVISION OF TRADEMARK LAW IN JAPAN RECENT MOVEMENT OF REVISION ABOUT IP LAWS IN JAPAN (December 19, 2006) CHANGE IN EXTENSION OF PERIOD FOR RESPONDING TO NOTICE OF REASON FOR REFUSAL REGARDING PATENT APPLICATIONS IN JPO (March 5, 2007) OFFICIAL FEES FOR PATENT AND TRADEMARK WILL BE REVISED ON OR AFTER JUNE 1, 2008 (June 1, 2008)