May 27, 2008
Official Fees for Patent and Trademark will be revised on or after June 1, 2008
Japanese Government has recently decided to revise the currently implemented Official Fees for Patent and Trademark and the new Official Fees will go into effect on or after June 1, 2008.
According to the new Official Fees System for Patent and Trademark, the currently implemented Official Fees are reduced so as to decrease a financial load of the applicants or owners of Patents and Trademarks to some extent.
We would like to briefly explain about these newly proposed Official Fees for Patent and Trademark, for your reference.
(I) Official Fees for Patent;
Official Filing Fees for Patent Application and Annual Registration will be reduced:
Under the newly proposed amended Patent Law, Official filing fee and Official annual registration fees will be reduced comparing with those of the current Official Fees, as shown hereunder.
Application Fee
|
|
Current Fee |
New Fee(draft) |
|
Patent Application |
16,000Yen |
15,000Yen |
Annual Registration Fee (for an application filed after Jan. 1, 1988 and RE. been filed on or after Apr. 1, 2004)
|
|
Current Fee |
New Fee( draft) |
|
First to Third year |
2,600+N(claims) ×200Yen |
2,300+ N(claims) ×200Yen |
|
Forth to Sixth year |
8,100+ N(claims) ×600Yen |
7,100+ N(claims) ×500Yen |
|
Seventh to Ninth year |
24,300+ N(claims) ×1,900Yen |
21,400+ N(claims) ×1,700Yen |
|
After Tenth year |
81,200Yen+ N(claims) ×6,400Yen |
61,600+ N(claims) ×4,800Yen |
*N (claims)=Number of claims
(II) Official Fees for Trademark;
Official Fees for Trademark Application, Registration and Renewal will be reduced;
Under the newly proposed amended Trademark Law, the Official Fees for a Trademark application, Registration of a granted Trademark and Renewal for registered Trademark will be reduced comparing with those of the current Official Fees, as shown hereunder.
Application Fee
|
|
Current Fee |
New Fee(draft) |
|
Trademark Application |
6,000+ N(class) ×15,000Yen |
3,400+ N(class) ×8,600Yen |
|
Defensive TM Application |
12,000+ N(class) ×30,000Yen |
6,800+ N(class) ×17,200Yen |
*N (class)=Number of class
Registration Fee
|
|
Current Fee |
New Fee(draft) |
|
Registration |
N(class) ×66,000Yen |
N(class) ×37,600Yen |
|
Registration (installment) |
N(class) ×44,000Yen |
N(class) ×21,900Yen |
|
Defensive TM Application |
N(class) ×66,000Yen |
N(class) ×37,600Yen |
*N (class)=Number of class
Renewal Fee
|
|
Current Fee |
New Fee(draft) |
|
Registration |
N(class) ×151,000Yen |
N(class) ×48,500Yen |
|
Registration (installment) |
N(class) ×101,000Yen |
N(class) ×28,300Yen |
|
Defensive TM Application |
N(class) ×130,000Yen |
N(class) ×41,800Yen |
*N (class)=Number of class
Individual Fees based on International Trademark Registration
|
|
Current Fee |
New Fee(draft) |
|
Individual Fee |
4,800+ N(class) ×15,000Yen |
2,700+N(class) ×8,600Yen |
|
N(class) ×66,000Yen |
N(class) ×37,600Yen |
|
|
Renewal Fee |
N(class) ×151,000Yen |
N(class) ×48,500Yen |
Copyright 2000
Saito & Hata International Patent Office.